Invention Grant
- Patent Title: Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium
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Application No.: US15211583Application Date: 2016-07-15
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Publication No.: US10081868B2Publication Date: 2018-09-25
- Inventor: Kosuke Takagi , Ryota Sasajima , Shintaro Kogura , Naonori Akae , Risa Yamakoshi , Toshiki Fujino , Masato Terasaki , Masayoshi Minami
- Applicant: HITACHI KOKUSAI ELECTRIC INC.
- Applicant Address: JP Tokyo
- Assignee: HITACHI KOKUSAI ELECTRIC INC.
- Current Assignee: HITACHI KOKUSAI ELECTRIC INC.
- Current Assignee Address: JP Tokyo
- Agency: Volpe and Koenig, P.C.
- Priority: JP2015-142902 20150717; JP2016-108773 20160531
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/469 ; C23C16/455 ; C23C16/24 ; H01L21/02
Abstract:
Provided is a technology including a nozzle base end portion which is provided in a processing chamber processing a substrate to extend in a vertical direction and into which a processing gas processing the substrate is introduced, a nozzle distal end portion which is configured in a U shape and in which a gas supply hole supplying the processing gas is provided to a side surface of the substrate, and a gas residence suppressing hole which is provided in a downstream end of the nozzle distal end portion and has a diameter larger than that of the gas supply hole.
Public/Granted literature
- US20170051408A1 GAS SUPPLY NOZZLE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM Public/Granted day:2017-02-23
Information query
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