- 专利标题： Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation
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申请号： US14964033申请日： 2015-12-09
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公开(公告)号： US10073351B2公开(公告)日： 2018-09-11
- 发明人: Rajiv Krishan Agarwal , Mark Richard Brown , Aiping Wu , David Barry Rennie , Yi-Chia Lee , Gene Everad Parris
- 申请人： AIR PRODUCTS AND CHEMICALS, INC.
- 申请人地址： US AZ Tempe
- 专利权人： VERSUM MATERIALS US, LLC
- 当前专利权人： VERSUM MATERIALS US, LLC
- 当前专利权人地址： US AZ Tempe
- 代理商 Anne B. Kiernan
- 主分类号： C11D7/32
- IPC分类号： C11D7/32 ; G03F7/42 ; C11D11/00 ; C11D7/26 ; H01L21/02
摘要：
A photoresist or semiconductor manufacturing residue stripping and cleaning composition comprising water, one or more alkaline compounds, one or more corrosion inhibitors, and one or more oxidized products of one or more antioxidants, the method of making the composition and the method of using the composition.
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