- 专利标题： Method of manufacturing pellicle assembly and method of photomask assembly including the same
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申请号： US15014054申请日： 2016-02-03
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公开(公告)号： US10065402B2公开(公告)日： 2018-09-04
- 发明人: Mun Ja Kim , Byung-Gook Kim , Hwan Chul Jeon , Ji-Beom Yoo , Dong-Wook Shin , Taesung Kim , Sooyoung Kim
- 申请人： SAMSUNG ELECTRONICS CO., LTD.
- 申请人地址： KR Suwon-si, Gyeonggi-do KR Suwon-si, Gyeonggi-do
- 专利权人： SAMSUNG ELECTRONICS CO., LTD.,RESEARCH & BUSINESS FOUNDATION SUNGKYUNK WAN UNIVERSITY
- 当前专利权人： SAMSUNG ELECTRONICS CO., LTD.,RESEARCH & BUSINESS FOUNDATION SUNGKYUNK WAN UNIVERSITY
- 当前专利权人地址： KR Suwon-si, Gyeonggi-do KR Suwon-si, Gyeonggi-do
- 代理机构： Lee & Morse, P.C.
- 优先权： KR10-2015-0079200 20150604
- 主分类号： B32B37/14
- IPC分类号： B32B37/14 ; B32B38/18 ; B32B37/00 ; G03F1/62 ; B32B37/10 ; B32B38/10 ; B32B37/12 ; H01L21/00 ; B32B38/16
摘要：
A method of manufacturing a pellicle assembly, the method including attaching a carbon-containing thin film onto a transfer membrane in a wet atmosphere; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; and separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached to the pellicle frame.
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