- 专利标题: Trap mechanism, exhaust system, and film formation device
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申请号: US14386419申请日: 2013-03-28
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公开(公告)号: US10036090B2公开(公告)日: 2018-07-31
- 发明人: Eiichi Komori , Hironori Yagi
- 申请人: TOKYO ELECTRON LIMITED
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 代理机构: Nath, Goldberg & Meyer
- 代理商 Jerald L. Meyer
- 优先权: JP2012-077044 20120329; JP2012-223867 20121009
- 国际申请: PCT/JP2013/059186 WO 20130328
- 国际公布: WO2013/146982 WO 20131003
- 主分类号: C23F1/00
- IPC分类号: C23F1/00 ; H01L21/306 ; C23C16/44 ; C23C16/18 ; F28B9/08 ; H01L21/67 ; B08B9/00
摘要:
A trap mechanism is provided in the middle of an exhaust passage through which an exhaust gas, which is exhausted from a film formation device body that forms a thin film on the surface of a workpiece (W), flows, and recovers a gas to be collected that is contained in the exhaust gas by cooling and liquefying the gas to be collected. The trap mechanism includes: a housing having a gas inlet and a gas outlet; a partitioning member that partitions the inside of the housing into retention spaces; communication paths that communicate the retention spaces with one another; and cooling jackets that cool the communication paths to cool the exhaust gas. With this structure, the exhaust gas is adiabatically expanded while being cooled, and the gas to be collected is efficiently cooled and liquefied.
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