- 专利标题: Target supply apparatus and EUV light generating apparatus
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申请号: US15019577申请日: 2016-02-09
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公开(公告)号: US10009991B2公开(公告)日: 2018-06-26
- 发明人: Toshihiro Nishisaka , Yoshiaki Kato , Fumio Iwamoto
- 申请人: GIGAPHOTON INC.
- 申请人地址: JP Tochigi
- 专利权人: Gigaphoton Inc.
- 当前专利权人: Gigaphoton Inc.
- 当前专利权人地址: JP Tochigi
- 代理机构: Studebaker & Brackett PC
- 主分类号: H05G2/00
- IPC分类号: H05G2/00
摘要:
A target supply device may include: a tank including a cylindrical main body, a first end portion blocking an axial first end of the main body, and a second end portion blocking an axial second end of the main body; a nozzle provided to the first end portion of the tank and configured to output a target material contained inside the tank; and an inert gas supply unit configured to supply inert gas into the tank, in which the inert gas supply unit includes a gas flow path penetrating the second end portion of the tank and configured to guide the inert gas in a direction toward an inner wall of the main body.
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