Process for the deposition, by cathodic pulverisation at least 100[deg]C of a photocatalytic coating comprising TiO 2 at least partially crystallised in anatase form, on a transparent or semi-transparent substrate (S) : Process for the deposition, by cathodic pulverisation of a photocatalytic coating comprising TiO 2 at least partially crystallised in anatase form, on a transparent or semi-transparent substrate (S) which is glass-type, vitreous ceramic, plastic, characterized in that the pulverisation is carried out on the substrate at least 100 [deg] C. INDEPENDENT claims are included for: (i) the coated substrate (S) where the coating has a high refractive index of at least 2.2 and is the last layer of a thin layer antireflective coating process composed of alternating layers (L) of high and low refractive indices; (ii) a glass roof or partition with optionally many layers containing one substrate (S).