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发明公开
CN110703383A 光学元件及其制造方法 有权

光学元件及其制造方法
摘要：
本发明提供一种光学元件的制造方法。该制造方法包括下列步骤：提供一基板；形成复数个金属栅于该基板上；形成一第一有机层于该基板上，位于该等金属栅之间；形成一第二有机层于该第一有机层与该等金属栅上；以及蚀刻该第二有机层与该第一有机层，以留下该等金属栅以及位于该等金属栅上的复数个图案化第二有机层。本发明亦提供一种通过该方法所制作的光学元件。
摘要（英）：

A method for fabricating an optical element is provided. The fabrication method includes the following steps. A substrate is provided. A plurality of metal grids are formed on the substrate. A first organic layer is formed on the substrate between the plurality of metal grids. A second organic layer is formed on the first organic layer and the plurality of metal grids. The second organic layer andthe first organic layer are etched to leave the plurality of metal grids and a plurality of patterned second organic layers on the plurality of metal grids. An optical element fabricated by the method is also provided.

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