The invention discloses an LED epitaxial quantum well growth method. The method comprises steps: a sapphire substrate is processed; a low-temperature GaN buffer layer grows on the sapphire substrate,the low-temperature GaN buffer layer is processed, and an irregular island is formed on the low-temperature GaN buffer layer; an undoped GaN layer grows on the low-temperature GaN buffer layer; a Si-doped N-type GaN layer grows on the undoped GaN layer; a multi-quantum well layer grows on the Si-doped N-type GaN layer; an AlGaN electron blocking layer grows on the multi-quantum well layer; a Mg-doped P-type GaN layer grows on the AlGaN electron blocking layer; and temperature reduction and cooling are carried out. According to the growth method disclosed in the invention, the light emitting efficiency of the LED can be effectively enhanced, warpage of the epitaxial wafer can be reduced, the qualified rate of the GaN epitaxial wafer is improved, the surface of the epitaxial layer becomes flat, and the appearance is better.