A mask, a mask apparatus and manufacturing method therefor, and mask manufacturing equipment. The mask comprises: a pattern part (1), comprising first edges (15) and second edges (16); first stretching fitting structures (2) used to relatively stretch the pattern part (1) along a first direction, the first stretching fitting structures (2) being located on the first edges (15); and second stretching fitting structures (3) used to relatively stretch the pattern part along a second direction, the second stretching fitting structures (3) being located on the second edges (16). The first edges (15) are located at two ends of the pattern part (1) in the first direction, the second edges (16) are located at two ends of the pattern part (1) in the second direction, and the first direction and the second direction intersect.