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发明公开
CN108251842A 蚀刻液组合物及利用该组合物的金属布线的制造方法 有权

蚀刻液组合物及利用该组合物的金属布线的制造方法
摘要：
根据本发明的一个实施例提供一种蚀刻液组合物及利用该组合物的金属布线的制造方法，蚀刻液组合物包含：8重量％至20重量％的过硫酸盐系化合物；从0.1重量％至5重量％的1‑氮系环型化合物、0.05重量％至1重量％的3‑氮系环型化合物及这些化合物的混合物中选择的1种以上的氮系环型化合物；0.1重量％至1重量％的氟系化合物；0.1重量％至1重量％的铜腐蚀防止化合物；以及余量的水。
摘要（英）：

An embodiment of the present invention provides an etching liquid composition and a method of producing a metal wiring using the composition. The etching liquid composition comprises: 8% by weight to20% by weight of a persulfate-based compound; one or more nitrogen-based cyclic compounds selected from 0.1% by weight to 5% by weight of a 1-nitrogen-based cyclic compound, 0.05% by weight to 1% by weight of a 3-nitrogen-based cyclic compound, and a mixture of these compounds; 0.1% by weight to 1% by weight of a fluorine-based compound; 0.1% by weight to 1% by weight of a copper corrosion preventing compound; and the balance of water.

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