The invention discloses a cleaning device and belongs to the field of semiconductor process equipment. A workpiece supporting table comprises a supporting platform, an angle adjusting unit and a support. The supporting platform and the angle adjusting unit are arranged on the support. The supporting platform is provided with a supporting plane used for bearing to-be-cleaned workpieces. The angle adjusting unit is used for adjusting the inclination angle of the supporting plane. The inclination angle of the supporting plane can be adjusted by arranging the angle adjusting unit, the workpeices are arranged on the supporting plane in the cleaning process, due to the fact that the supporting plane is inclined, residual photoresist, a developing solution and blots can be washed away more easily, and thus the cleaning effect is further improved.