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发明公开
CN106276952A 沸石骨架的杂质如RUT由X射线衍射测定小于制备具有CHA结构的沸石的方法 5％。 无效 - 驳回

沸石骨架的杂质如RUT由X射线衍射测定小于制备具有CHA结构的沸石的方法 5％。
摘要：
本发明涉及一种制备具有CHA骨架结构且组成具有摩尔比(n SiO2):X2O3的沸石的方法，其中X为三价元素以及其中n至少为10，所述方法包括：(i)制备含有如下组分的水溶液：至少一种X2O3源，其中X选自Al、B、Ga以及两种或更多种的混合物，至少一种SiO2源，至少一种四甲基氢氧化铵(TMAOH)以外的起CHA结构用模板作用的有机结构导向剂(SDA)以及四甲基氢氧化铵(TMAOH)，其中所述SDA或其混合物以使得(i)中的水溶液具有0.01-5的SDA:TMAOH摩尔比的量使用；(ii)水热结晶根据(i)的水溶液；其中(i)的水溶液以小于0.005Cu:((n YO2)+X2O3)的量含有铜，其中n为10-50。本发明还涉及可以由该方法得到和/或由该方法得到的沸石材料以及具有骨架结构CHA的沸石材料本身，其组成具有摩尔比(n SiO2):X2O3，其中X为三价元素且n至少为10，并且其中由扫描电子显微法测定的晶体尺寸大于1微米以及其中菱沸石骨架是相纯净的，其他
摘要（英）：

The present invention relates to a process for the preparation of zeolites having CHA framework structure and a composition comprising the molar ratio (n SiO2):X2O3, wherein X is a trivalent element, and wherein n is at least 10, the process comprising (i) preparation of an aqueous solution containing at least one source for X2O3, wherein X is selected from Al, B, Ga, and a mixture of two or more, and at least one source for SiO2, at least one organic structure directing agent (SDA) other than Tetramethylammonium hydroxide (TMAOH), acting as a template for the CHA structure, and Tetramethylammonium hydroxide (TMAOH), wherein the SDA or mixtures thereof are employed in such amounts that the aqueous solution in (i) exhibits a molar ratio of SDA:TMAOH of 0.01 to 5; (ii) hydrothermal crystallization of the aqueous solution according to (i); wherein the aqueous solution of (i) contains copper in an amount less than 0.005 Cu: ((n YO2)+X2O3) where n is in the range of 10 to 50. The present invention also relates to the zeolitic materials obtainable and/or obtained by this process as well as to a zeolitic material as such, having framework structure CHA, having a composition comprising the molar ratio (n SiO2):X2O3, wherein X is a trivalent element and n is at least 10, and wherein the crystal size, as determined from Scanning Electron Microscopy, is greater than 1 micrometer and wherein the chabazite framework is phase-pure having an impurity of other zeolitic frameworks, such as RUT as determined by X-ray Diffraction, of less than 5%.

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