知搜-全球专利检索

  1. 登录
  2. 注册
发明公开
CN106147218A 一种改性的高阻隔薄膜 无效 - 驳回 转让

一种改性的高阻隔薄膜
摘要：
本发明涉及一种改性的高阻隔薄膜，所述薄膜包括表层a、芯层、表层b，其特征在于：表层a中MXD6的含量为30～40％，PA6的含量为63～85％，防粘母料的含量为2～4％，相容剂的含量为3～8％，纳米稀土成核剂的含量为5.5～8％；芯层中MXD6的含量为95～99.9％，纳米稀土成核剂的含量为0.1～5％；在表层b中MXD6的含量为10～30％，PA6的含量为63～85％，防粘母料的含量为2～4％，相容剂的含量为8.5‑12％，纳米稀土成核剂的含量为2～4.5％。本发明所提供的改性的高阻隔薄膜提高了断裂伸长率，降低了雾度。
摘要（英）：

The invention relates to a modified high-barrier film. The film comprises a surface layer a, a core layer b and a surface layer b and is characterized in that the surface layer a comprises 30-40% of MXD6, 63-85% of PA6, 2-4% of anti-sticking master batch, 3-8% of a compatilizer and 5.5-8% of a nano rare earth nucleating agent; the core layer comprises 95-99.9% of MXD6 and 0.1-5% of the nano rare earth nucleating agent; the surface layer b comprises 10-30% of MXD6, 63-85% of PA6, 2-4% of anti-sticking master batch, 8.5-12% of the compatilizer and 2-4.5% of the nano rare earth nucleating agent. The modified high-barrier film has advantages that elongation at break is increased, and haze degree is lowered.

0/0