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发明公开
CN104936932A 用于制备石墨烯纳米带的聚合物前体和用于制备它们的合适低聚亚苯基单体 失效 - 放弃专利权

用于制备石墨烯纳米带的聚合物前体和用于制备它们的合适低聚亚苯基单体
摘要：
本发明涉及通式I的低聚亚苯基单体，其中R1为H、卤素、-OH、-NH2、-CN、-NO2，或者线性或支化、饱和或不饱和C1-C40烃残基，其可被卤素(F、Cl、Br、I)、-OH、-NH2、-CN和/或-NO2取代1-5倍，且其中一个或多个CH2-基团可被-O-、-S-、-C(O)O-、-O-C(O)-、-C(O)-、-NH-或–NR3-替代，其中R3为任选取代的C1-C40烃残基，或者任选取代的芳基、烷基芳基、烷氧基芳基、烷酰基或芳酰基残基；R2a和R2b为H，或者任选一对或多对相邻R2a/R2b连接形成六元碳环中的单键；m为0-3的整数；n为0或1；且X为卤素或三氟甲基磺酸盐，且Y为H；或者X为H，且Y为卤素或三氟甲基磺酸盐。本发明进一步涉及聚合物前体以及由低聚亚苯基单体和聚合物前体制备石墨烯纳米带的方法。
摘要（英）：

The invention relates to oligophenylene monomers of general formula I, wherein R<1> is H, halogene, -OH, -NH2, -CN,-NO2, or a linear or branched, saturated or un-saturated C1 -C40 hydrocarbon residue, which can be substituted 1-to 5-fold with halogene (F, Cl, Br, I), -OH, -NH2, -CN and/or -NO2, and wherein one or more CH2- groups can be replaced by -O-, -S-, -C(O)O-, -O-C(O)-, -C(O)-, -NH-or -NR<3>-, wherein R<3> is an optionally substituted C1 -C40 hydrocarbon residue, or an optionally substituted aryl, alkylaryl, alkoxyaryl, alkanoyl or aroyl residue; R<2a> and R<2b> are H, or optionally one or more of the pairs of adjacent R<2a>/R<2b> is joined to form a single bond in a six-membered carbocycle; m is an integer of from 0 to 3; n is 0 or 1; and X is halogene or trifluoromethylsulfonate, and Y is H; or X is H, and Y is halogene or trifluoromethylsulfonate. The invention further relates to polymeric precursors as well as methods for preparing graphene nanoribbons from the oligophenylene monomers and the polymeric precursors.

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