The present invention provides a method of manufacturing a transparent conductive film, and aims to restrain the reduction in aesthetics caused by the pattern boundary of a transparent conductive film in the transparent conductive film of which a transparent conductor layer is patterned, and even the thickness of a base material is reduced to less than 80 micrometers. The method of manufacturing the transparent conductive film has the steps of: preparing a laminated body in which a transparent conductive layer that is not patterned is formed on a flexible transparent base, removing a part of the transparent conductive layer to form the pattern forming part having the transparent conductive layer on the flexible transparent base and the pattern opening part not having the transparent conductive layer on the flexible transparent base, and heating the laminated body in which the transparent conductive layer is patterned. The absolute value of the difference H1-H2 of the dimensional change rate H1 of the pattern forming part and the dimensional change rate H2 of the pattern opening part in the heat treatment step is preferably less than 0.03%.