The invention provides a method for estimating film thickness based on an even function seismic response. The method comprises the steps of carrying out 90-degree phase shifting on a zero-phase odd function seismic response to form the even function seismic response, carrying out matching pursuit time-frequency analysis on the even function seismic response to obtain a peak amplitude and peak frequency, and estimating the film thickness through the combination of the peak amplitude and peak frequency. A device with the method used comprises a preprocessing module used for carrying out 90-degree phase shifting on the zero-phase odd function seismic response to form the even function seismic response, a matching pursuit time-frequency analysis module used for carrying out analysis on the even function seismic response to obtain the peak amplitude and peak frequency, and a film thickness obtaining module used for estimating the film thickness through the combination of the peak amplitude and peak frequency. According to the method and device for estimating the film thickness based on the even function seismic response, the equivalence between 90-degree phase shifting and film odd-even relation conversion is verified, the advantage of an even function on film thickness estimation is determined, and prediction of the film thickness is facilitated through the combination of the peak amplitude and peak frequency.