The invention provides a method of manufacturing a ferroelectric thin film which has an extremely favorable usage efficiency of materials, furthermore, has a desirable film structure, and has excellent electrical characteristics. The method of manufacturing the ferroelectric thin film on a lower electrode (20a) by electrostatically spraying a ferroelectric thin film-forming sol-gel solution (21) from a spout (14a) of a capillary (14) toward the lower electrode (20a) of a substrate (20) having the lower electrode (20a) so as to coat the sol-gel solution (21) on the lower electrode (20a) and form a coated film, drying, calcining, and then firing the coated film so as to crystallize the coated film, in which a distance between the spout (14a) of the capillary (14) and the lower electrode (20a) and an applied voltage during electrostatic spray are set so that a refractive index during drying and calcination of the coated film becomes 2 or more, and a liquid amount of the sol-gel solution (21) per spray is set so that a film thickness sets in a range of 150 nm or less when the sol-gel solution (21) is coated in a single spray process, calcined, and then fired so as to be crystallized.