The invention discloses an exposure device for a spinal column posterior minimally invasive nail placing operation. The exposure device is designed according to part operative route soft tissue features and part bone structure features. The exposure device comprises a transverse process drag hook and a facet joint drag hook. A gap between lower separated musculimultifidi and longissimus can be observed directly by utilizing of the exposure device. The exposure device can easily reach to a nail placing position of pedicle of vertebral arch without injury, and a nail placing tunnel space with 10 to 15-degree outer spread is formed at a part after drag hooks are placed accurately. In the process of placing a nail, the far-end of the transverse process drag hook can stride on transverse process, and confrontation and traction between the transverse process drag hook and the facet joint drag hook provide enough space for nail placing operation and simultaneously provides entry points and directions for the placing of the pedicle of vertebral arch. A concave crescent design is adopted at the far-ends of the drag hooks, when drag is carried out, part soft tissue is protected, and injury of tissues is avoided.