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发明公开
CN102211311A 化学机械抛光设备 有权 转让 质押

化学机械抛光设备
摘要：
本发明公开了一种化学机械抛光设备，所述化学机械抛光设备包括：多个化学机械抛光机，所述多个化学机械抛光机分别用于抛光晶圆；机械手，所述机械手用于搬运晶圆；和过渡装置，所述过渡装置用于放置晶圆，其中所述多个化学机械抛光机和所述过渡装置围绕所述机械手布置以便所述机械手将所述过渡装置上的未抛光晶圆搬运到所述化学机械抛光机上且将抛光后的晶圆从所述化学机械抛光机搬运到所述过渡装置上且在所述多个化学机械抛光机之间搬运晶圆。根据本发明实施例的化学机械抛光设备具有工作效率高的优点。
摘要（英）：

The invention discloses chemical-mechanical polishing equipment, which comprises a plurality of chemical-mechanical polishing machines, a manipulator and a transition device, wherein the chemical-mechanical polishing machines are respectively used for polishing wafers; the manipulator is used for conveying the wafers; the transition device is used for holding the wafers; the chemical-mechanical polishing machines and the transition device are arranged around the manipulator so that the manipulator can convey the unpolished wafers on the transition device to the chemical-mechanical polishing machines, convey the polished wafers to the transition device from the chemical-mechanical polishing machines, and convey the wafers among the chemical-mechanical polishing machines. The chemical-mechanical polishing equipment in the embodiment of the invention has the advantage of high working efficiency.

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