The invention provides a precision rotating, positioning and focusing system of a nano-photon straight write head, belonging to the field of straight writing and photoetching equipment. (1) A straight write head adjusting device can move by means of nanometer level along the Z direction; (2) the straight write head adjusting device can rotate by 0-90 degrees; (3) a substrate table can rotate at ahigh speed; (4) a cantilever of the straight write head has a certain elastic distortion; and (5) the straight write head adopts a design structure of an aerodynamic principle to be capable of floating above the surface of a substrate under the action of an air current generated by rotating the substrate table. The straight write head can float above the surface of the substrate within the range of dozens of nanometers due to the air current generated by rotating the substrate table at a high speed, so that the distance between the straight write head and the surface of the substrate is kept to be within the action range of a near field evanescent wave during photoetching, the restriction of the diffraction limit is broken through, and a high-resolving power photoetching result is realized.