The present invention relates to a photosensitive resin composition for a black matrix, and the black matrix prepared therefrom. Especially, the photosensitive resin composition comprises 5-30 weight% of a first solvent with a boiling point of 110-159 DEG C, 55-90 weight% of a second solvent with a boiling point of 160-200 DEG C, and 3-15 weight% of a second solvent with a boiling point of 201-280 DEG C. The first, second, and third solvents use aliphatic compounds, specifically comprising at least one selected from the group consisting of alkyl ester, alkyl ketone, alkyl ether, and alkyl alcohol. As a result, a uniform thin film with no surface defects can be obtained, and a black matrix pattern with few defects can be obtained due to the high light shielding property and excellent processing properties. Therefore, the invention is useful for a liquid crystal display.