知搜-全球专利检索

  1. 登录
  2. 注册
发明授权
CN101916043B 厚胶介质补偿紫外光垂直光刻工艺三维光强分布模拟方法 失效 - 权利终止

  • 专利标题： 厚胶介质补偿紫外光垂直光刻工艺三维光强分布模拟方法
  • 专利标题（英）： Analogy method for distribution of three-dimensional light intensity compensated by heavy glue medium in UV-light vertical photoetching technology
  • 申请号： CN201010236322.8
    申请日： 2010-07-26
  • 公开(公告)号： CN101916043B
    公开(公告)日： 2011-12-21
  • 发明人: 周再发 , 黄庆安 , 李伟华
  • 申请人： 东南大学
  • 申请人地址： 江苏省南京市江宁开发区东南大学路2号
  • 专利权人： 东南大学
  • 当前专利权人： 东南大学
  • 当前专利权人地址： 江苏省南京市江宁开发区东南大学路2号
  • 代理机构： 南京苏高专利商标事务所
  • 代理商 柏尚春
  • 主分类号： G03F7/20
  • IPC分类号： G03F7/20 ;  G06F17/50
厚胶介质补偿紫外光垂直光刻工艺三维光强分布模拟方法
摘要：
本发明涉及一种厚胶介质补偿紫外光垂直光刻工艺三维光强分布模拟方法，该方法用于厚胶介质补偿紫外光垂直光刻工艺三维光强模拟模型，该模型为立方体，自上到下依次包括相互平行的掩模版(M)、补偿介质(C)、厚胶(R)和衬底(W)，在掩模版(M)设有掩模孔，该掩模孔的四个边界定点的坐标分别为A1(x1，y1，0)、A2(x2，y2，0)、A3(x3，y3，0)和A4(x4，y4，0)，补偿介质(C)的厚度为d1，厚胶(R)的厚度为d，厚胶(R)内任意一个网格坐标P(x，y，z)；厚胶(R)内任意一个网格坐标P(x，y，z)到掩膜版(M)的距离为z。该方法解决了目前没有厚胶紫外光垂直光刻工艺的高精度三维光强分布模拟方法的问题。
摘要（英）：

The invention relates to an analogy method for the distribution of three-dimensional light intensity compensated by rubber medium in a UV-light vertical photoetching technology which is used for an analogy model for the distribution of three-dimensional light intensity compensated by rubber medium in the UV-light vertical photoetching technology. The model is a cube and successively comprises a maskplate (M), compensation medium (C), heavy rubber (R) and a substrate (W) which are mutually parallel from top to bottom, wherein the maskplate (M) is provided with a mask opening, and the coordinates of four boundary fixed points of the mask opening are respectively as follows: A1 (x1, y1, 0), A2 (x2, y2, 0), A3 (x3, y3, 0) and A4 (x4, y4, 0); the thickness of the compensation medium is d1, the thickness of the heavy rubber (R) is d, a grid coordinate P (x, y, z) is any calculation grid in the heavy rubber (R), and the distance between any grid coordinate P (x, y, z) in the heavy rubber (R)and the maskplate (M) is z. The method solves the problem that no analogy method for the distribution of three-dimensional light intensity compensated by rubber medium in the UV-light vertical photoetching technology is provided at present.

公开/授权文献
0/0