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发明公开
CN101448640A 热质转印基底膜、供体元件、以及它们的制备与使用方法 无效 - 撤回

热质转印基底膜、供体元件、以及它们的制备与使用方法
摘要：
本发明提供基底膜、热质转印供体元件、以及制备和使用所述基底膜与所述热质转印供体元件的方法。在一些实施例中，此类基底膜和供体元件包括至少两个成对层，其中每个成对层都包括吸收性第一层和基本非吸收性的第二层。本发明还提供制备供体元件的方法，所述供体元件包括基本非吸收性的基底、吸收性第一层、和非吸收性的第二层，其中所述基本非吸收性的基底的组成与所述基本非吸收性的第二层的组成基本相同。
摘要（英）：

The present invention provides substrate films, thermal mass transfer donor elements, and methods of making and using the same. In some embodiments, such substrate films and donor elements include at least two dyads, wherein each dyad includes an absorbing first layer and an essentially non-absorbing second layer. Also provided are methods of making a donor element that includes an essentially non-absorbing substrate, an absorbing first layer, and a non-absorbing second layer, wherein the composition of the essentially non-absorbing substrate is essentially the same as the composition of the essentially non-absorbing second layer.

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