The invention relates to a source arrangement of a VPE deposition device, comprising a container (2) containing a liquid or solid starting material (1) and having a top opening, a feed line (3) for a reactive gas (4) which reacts with the starting material (1) in order to produce a process gas (5) that contains the starting material. The aim of the invention is to temporally stabilize the source reaction. For this purpose, a cover (6) rests directly on the starting material (1) and defines a volume (8) between the cover and the surface (7) of the starting material (1), the reactive gas (4) flowing through said volume and the feed line (3) running into it.