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Invention Publication
CN101375372A 曝光方法、曝光装置、光罩以及光罩的制造方法 有权

  • Patent Title: 曝光方法、曝光装置、光罩以及光罩的制造方法
  • Patent Title (English): Exposure method, exposure apparatus, photomask and photomask manufacturing method
  • Application No.: CN200780003500.9
    Application Date: 2007-02-08
  • Publication No.: CN101375372A
    Publication Date: 2009-02-25
  • Inventor: 加藤正纪
  • Applicant: 株式会社尼康
  • Applicant Address: 日本东京
  • Assignee: 株式会社尼康
  • Current Assignee: 株式会社尼康
  • Current Assignee Address: 日本东京
  • Agency: 北京中原华和知识产权代理有限责任公司
  • Agent 寿宁
  • Priority: 039372/2006 2006.02.16 JP; 279389/2006 2006.10.13 JP
  • International Application: PCT/JP2007/052241 2007.02.08
  • International Announcement: WO2007/094235 JA 2007.08.23
  • Date entered country: 2008-07-25
  • Main IPC: H01L21/027
  • IPC: H01L21/027 ;  G03F1/08 ;  G03F7/20
曝光方法、曝光装置、光罩以及光罩的制造方法
Abstract:
本发明是分别经由具有放大倍率的多个投影光学系统，将光罩(M)的图案(M1、M2)投影曝光于基板上的曝光方法，此曝光方法是将具有以对应于上述放大倍率的位置关系而非连续地配置的第1图案区域(M1)、以及至少一部分设于第1图案区域(M1)之间的第2图案区域(M2)的光罩(M)，配置于投影光学系统的物体面侧，使第1图案区域(M1)与第2图案区域(M2)中的其中一个图案区域的放大像分别投影曝光至配置于投影光学系统的像面侧的基板上之后，将另一个图案区域的放大像投影曝光于该基板上。
Abstract(English):

There is disclosed an exposure method is a method of projecting patterns (M1, M2) of a mask (M) onto a substrate to effect exposure thereof, through a plurality of projection optical units each having an enlargement magnification, and the exposure method comprises: placing the mask (M) having first pattern regions (M1) arranged discontinuously in a positional relation corresponding to the enlargement magnification, and second pattern regions (M2) provided at least in part between the first pattern regions (M1), on the object plane side of the projection optical units; projecting enlarged images of either of the first pattern regions (M1) and the second pattern regions (M2) onto the substrate disposed on the image plane side of the projection optical units to effect exposure thereof; and then projecting enlarged images of the other pattern regions onto the substrate to effect exposure thereof.

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